DE200 脈沖激光薄膜沉積系統超高真空脈沖激光沉積腔室 超高真空STM腔室 超高真空樣品操縱臺 多靶轉臺 預真空進樣室
Typical PLD System Configuration and Variations
1. Typical PLD Configuration
The substrate and target are introduced through a load lock chamber opposite the target gearbox. The substrate is then rotated on its polar axis to face the target gearbox. The substrate can be moved out of the way for transfer of the targets. This is one of the most common and economical configurations.
Typical PLD configuration, vertically-mounted substrate manipulator
Typical PLD substrate manipulator with 2" quartz lamp heater
Typical PLD target manipulator, horizontal mount, STLC target system
2. Vertical PLD Configuration
This design features up-facing, gravity-held target holders to accommodate liquid, powder, or conventional targets. A custom transfer fork moves substrates and targets into place via standard load lock chamber.
3. Simple PLD Configuration
This design offers basic substrate and target devices with no XY or Z adjustment. Substrate and target changes are done at atmosphere.
4. Multi-Purpose PLD Configuration
This design permits MBE growth, via bottom-flange-mounted evaporation sources, as well as PLD growth. Substrate assembly faces the side of the chamber for PLD, the bottom for MBE, and the other side for in-vacuum transfer of substrates.
PLD substrate manipulator with 2" quartz lamp heater and gas shower ring.
We offers an extensive line of substrate and target manipulators as well as load lock and sample transfer systems for PLD systems. Our standard modular components can be configured in a variety of ways to meet your specific PLD system design. We can also design, integrate and certify complete PLD systems.
Typical Manipulator Specifications
Orientation Vertical or Horizontal X-Y movement ±0.5" or ±1.0" Substrate sample size<2" diameter Targets 6 - 1" (other configurations available) Sample orientation any Sample heating SHQ to 700°C (water-cooled heater) Vacuum environment UHV, O2 In-vacuum sample transfer optional Base flange 8"